Reporters learned from the Institute of Optics and Precision Mechanics, Chinese Academy of Sciences on the 23rd, the microelectronics equipment R & D team independently developed UV nanoimprint lithography machine.
According to the Chinese Academy of Sciences Institute of Optoelectronics Microelectronics Equipment General Manager Hu Song introduction, the Institute independently developed a new lithography machine, nanoimprint this new high-resolution lithography technology, with low-cost, high efficiency features of ultraviolet light Engraved technology organic combination.
This reporter has learned that this device uses a new nano-alignment technology, the original lithography equipment alignment accuracy from the sub-micron level to nano-scale. Alignment is one of the three core indicators of lithography equipment, is the key to the realization of functional device processing. Under the continuous funding of the National Natural Science Foundation, the institute completed the independent research and development of high-precision alignment technology based on Moire fringes and obtained more than 20 patents.
"The successful application of this technology in the lithography machine has broken through the bottleneck problem of the existing nano-scale structure processing and has provided the technical guarantee for the processing of high-precision nano-devices." Hu Song said.
It is reported that the device can be widely used in the preparation of micro and nano-structure devices such as micro / nano fluidic chip processing, micro / nano optical elements, micro / nano grating and NMEMS devices, and has broad application prospects. At present, preliminary tests and small batch production have been completed. Has been in college and business users to promote.
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